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LISTING DETAILS
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Industry >
Machinery Equipment |
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Sell Branson/IPC L3200 single wafer downstream stripper Semiconductor Equipment from Allwin21 Corp. |
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Plasma Etch/Asher/Descum:
(1)Upgraded Matrix 105 (2)Upgraded Matrix 205 (3)Upgraded Matrix 303 (4)Upgraded Matrix 403(5)Upgraded Tegal 901 (6)Upgraded Tegal 903 (7)Upgraded Tegal 901e(8)Upgraded Tegal 903e (9)Upgraded Gasonics AE 2001 (10)Upgraded Gasonics Aura 1000 (11)Upgraded Gasonics Aura 3010 (12)Upgraded Gasonics PEP 3510 (13)Upgraded Branson IPC 3000
http://www.allwin21.com
peterchen@allwin21.com Phone: 001-408-988-5188 Peter Chen
Reactor Center
* Dual quartz chambers for 100-150mm wafers, cassette to casette operation
* Automatic pneumatic soft-lift assemblies for each chamber
* In-line gas filters (0.05 micron)
* Two PM 732 automatch networks
* Quartz halogen lamp for preheating
* Process capabilities: positive and negative resist, hardened resist, polyimide
Process control and instrumentation
* Microprocessor controller, menu driven
* 20 recipes maximum
* Programmable Process Parameters: Gas Flow, Chamber Pressure, RF Power, Strip time, Heat Lamp On time, overstrip time
* Programmable Tolerance Limits: RF Power (forward and reflected), Time, Pressure, Gas flow, Pumpdown
* Automatic pressure control
* CRT system status display
* Programmable tolerance limit alarm
* Sixty four key, alphanumeric keypad for entry of process and system parameters
* seventy two hour battery backed RAM for program memory
Gas Handling Module and Control Features
* Two process gas lines and one purge line to include: One O2 @ 4000 SCCM mass flow controller, Optional gas (blank), fast and slow N2 purge
* All Stainless steel valves and gas lines
* Automatic variable throttle valve for pressure control
* Separate capacitance manometers for each chamber with isolation valve
Wafer Handling and Sensing
* Automatic pick-and-place wafer handling
* Two elevator cassette stands for send-to-receive operation
DC Power Module
* Distributes AC/DC power to system
System Power Control Panel
* AC ON/OFF for system power, RF generator, and vacuum pumps
Power Cabinet Assembly
* 510 Power Distribution Module
* Wafer Heating Module
* Separate control for system power, RF generator, and vacuum pumps control signal
* Shielded high-voltage components
* Emergency OFF switches
* Cover safety interlocks
* 12-VAC control to complete system
* ENI Mod.-12A RF Generator, 13.56MHz, crystal controlled, 0-1000 watts, continuously rated, Solid state, water-cooled
Safety and Security Features
* All covers interlocked
* Emergency OFF switches
* Electronic and software interlocks for RF power, wafer heating and gas flow
Facility Requirements
* Compressed air: 60 to 120 psig (clean and dry)
* System Electrical power: 200 to 240VAC, 40 amp, 1 phase, 50/60 Hz
* Wafer Heating power: 200 to 240VAC, 15 amp, 1 phase, 50/60 Hz
* Cooling water: 1.2 gal/min (house water, filtered) for RF generator
* House vacuum: at leastg .8CFM @ 20 inches Hg
* Mainframe air exhaust: 4 inch duct flange, 100 CFM
Allwin21 Corp. focus on the following tools Semiconductor Equipments :
Rapid Thermal Process/Annealing:
(1)Upgraded AG 210 (2)Upgraded AG 410 (3)Upgraded AG 610(AccuThermo AW 610).
(4)Upgraded AG 4100 (5)Upgraded AG 4100S (6)Upgraded AG 4108 (7)Upgraded AG 8108
(8)Upgraded AG 8800
Plasma Etch/Asher/Descum:
(1)Upgraded Matrix 105 (2)Upgraded Matrix 205 (3)Upgraded Matrix 303 (4)Upgraded Matrix 403(5)Upgraded Tegal 901 (6)Upgraded Tegal 903 (7)Upgraded Tegal 901e(8)Upgraded Tegal 903e (9)Upgraded Gasonics AE 2001 (10)Upgraded Gasonics Aura 1000 (11)Upgraded Gasonics Aura 3010 (12)Upgraded Gasonics PEP 3510 (13)Upgraded Branson IPC 3000
PECVD/RIE/ICP:
(1)STS 310 (2)STS 320 (3)Plasma Thermal 700 720 (4)Plasma Thermal 790
Probe/Tester:
(1)EG 1034 (2)EG 2001 (3)EG 2010 (4)HP 4062 (5)HP 4145B (6)HP 4142B (7)HP 4155
(8)HP 4084B (9)HP 4085B
http://www.allwin21.com
peterchen@allwin21.com Phone: 001-408-988-5188 Peter Chen
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Location: |
Santa Clara, California, USA |
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Contact
Person:
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yanhongtan |
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Phone: |
001-408-988-5188 |
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